About The Position

Applied Materials’ Ion Implantation Business Unit is seeking a summer 2027 intern to help develop plasma processing tools used in ion implantation, dry etch, deposition, and material modification. The intern will perform numerical investigations of semiconductor processing tool components using commercial and in-house software, analyze results, draw scientific conclusions, and present findings at internal meetings. The position also involves leading small design projects focused on beamline and plasma source optimization. The internship is scheduled to run from May 24 through August 13, 2027.

Requirements

  • Be pursuing an M.S. or Ph.D. in Physics, Electrical Engineering, Nuclear Engineering, Mechanical Engineering, Chemistry, or a related field.
  • Be in good academic standing with a GPA of 3.0 or above on a 4.0 scale.
  • Be a quick learner.

Nice To Haves

  • Experience in ion beam transport, magnet design, or plasma modeling.

Responsibilities

  • Perform numerical investigations of elements of semiconductor processing tools using commercial and in-house software.
  • Analyze results, draw scientific conclusions, and present findings at internal meetings.
  • Lead small design projects involving beamline and plasma source optimization.

Benefits

  • Comprehensive benefits package.
  • Candidates may be eligible for participation in a bonus program and a stock award program, as applicable.
  • Relocation assistance is available to eligible candidates.
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