As a lead Optical Proximity Correction (OPC) R&D Engineer, develop and implement high-quality technology solutions to optimize pattern fidelity, process window, and reliability for critical memory patterning layers. Use industry-standard software to model and correct optical and other patterning effects, and apply design for manufacturability (DFM) and resolution enhancement techniques (RET) so final chip layouts transfer accurately to wafers and meet manufacturing requirements. Guide other engineers in developing these solutions. The role includes developing OPC models and recipes, leading patterning development and tapeout readiness, evaluating OPC performance with wafer data and simulations, and providing technical guidance and training to internal teams. Collaborate with design rule, lithography, process integration, tapeout, mask engineering, and development fab teams. The position is primarily office-based, is hybrid, and can be aligned to San Jose or Rancho Cordova, California. Some international travel is expected. Relocation is available.
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Job Type
Full-time
Career Level
Senior