As a lead Optical Proximity Correction (OPC) R&D Engineer, develop and implement high-quality technology solutions—and guide other engineers in doing so—to optimize pattern fidelity, process window, and reliability for critical memory patterning layers. Use industry-standard software to model and correct optical and other patterning effects, and apply design-for-manufacturing (DFM) and resolution enhancement technology (RET) solutions so that chip layouts transfer accurately to wafers and meet manufacturing requirements. The role is hybrid and can be aligned to San Jose or Rancho Cordova, California, with relocation available. It is primarily office-based and involves some international travel.
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Job Type
Full-time
Career Level
Senior