The Optical Proximity Correction (OPC) Engineer develops computational lithography solutions that enable robust patterning and manufacturability of advanced semiconductor technologies. The role develops and maintains OPC technology files and works across lithography, design rules, etch, modeling, and infrastructure teams to improve pattern fidelity, process margin, and yield. The engineer develops, qualifies, maintains, and optimizes OPC technology files, recipes, and computational lithography solutions for advanced-generation semiconductor lithography processes. They develop and evaluate OPC strategies, model-based corrections, and patterning solutions, and validate and release those solutions through simulation-to-wafer correlation, process-window assessment, hotspot verification, and quality and change-control methodologies. The role also performs root-cause analysis of printing, patterning, and yield-limiting hotspots, develops automated analysis and data-processing workflows, and contributes to cross-functional technology development projects. The position requires a relevant bachelor's degree, working knowledge of semiconductor lithography and OPC, experience with computational lithography or related patterning tools, data-analysis and root-cause skills, and scripting or programming ability. Travel may be up to 10%.
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Job Type
Full-time