ASML EUV Light Sources uses high-power lasers interacting with tin material to generate the plasma that produces EUV light. Correct alignment between the lasers and tin material is essential for efficient, stable operation. High-speed camera images captured during EUV formation contain spatial information about this interaction. The intern will use machine learning and image-analysis techniques on high-speed images from controlled experiments to identify image characteristics that indicate good laser-to-tin alignment and translate them into measurable key performance indicators (KPIs). The project includes organizing image data, extracting features using conventional image processing and/or ML/AI methods, developing image-based KPIs, and validating them against performance measurements and across operating conditions. Success means producing KPIs with clear, repeatable relationships to alignment quality and improved observability compared with the current methodology. This is an on-site position in San Diego, California. The intern must be willing to work in a clean-room environment while wearing required protective garments and equipment for the duration of a shift. Candidates must be authorized to work in the United States without employer sponsorship and legally authorized to access any controlled technology required for the position. Offers are subject to a background check and any other required tests.
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Career Level
Intern
Education Level
No Education Listed