ASML US, LP develops lithography machines that enable leading chipmakers to produce smaller, more powerful microchips. Its research team develops technologies for next-generation high-power extreme ultraviolet (EUV) light sources based on laser-produced plasma. A key part of EUV generation is producing stable molten tin droplets at high rates, speeds, and positional accuracy. The intern will work across physics, engineering, and materials science to help define the droplet generator architecture for future EUV sources. The role calls for curiosity, innovation, strong technical understanding, and an experimental mindset to measure complex phenomena and better understand and control tin droplet behavior. The intern will identify scientific learning objectives and design experiments, demonstrate system performance against future technology targets, test and troubleshoot systems and subsystems, analyze results, and communicate findings to engineering and product development teams. Work may be independent or collaborative and may involve tin delivery subsystems, ultra-high-vacuum systems, and optical modules on test benches.
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Job Type
Full-time
Career Level
Intern