ASML US, LP develops lithography machines that enable the production of advanced microchips. This internship is on a source research team working on technologies for next-generation, high-power extreme ultraviolet (EUV) light sources based on laser-produced plasma. The role focuses on molten tin droplet generation, a key part of the EUV process: producing stable droplets at high rates, speeds, and positional accuracy to fuel the plasma and synchronize the light source. The intern will work across physics, engineering, and materials science to investigate droplet-generator technology. The work includes identifying scientific learning objectives, designing and conducting experiments, demonstrating system performance, analyzing test results, troubleshooting test-bench subsystems, and communicating findings to engineering and product development teams. The position calls for curiosity, innovation, strong experimental skills, and the ability to work independently and collaboratively in an early-stage research environment.
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Career Level
Intern