Intern - Photomask Wet Process Engineering

Micron Technology • Boise, ID

4d

About The Position

Our vision is to transform how the world uses information to enrich life for all. Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. Micron Technology is a global leader in memory and storage solutions, transforming how the world uses information to enrich life for all. At the Mask Technology Center (MTC), we develop and manufacture advanced photomasks that enable next-generation semiconductor technologies. As a Photomask Wet Process Engineering Intern, you will join the MTC Cleans Team and contribute to the development of advanced cleaning and resist strip processes used in the fabrication of DUV and EUV photomasks. This role provides hands-on experience in semiconductor process development, defect reduction, contamination control, and data-driven engineering. You'll have the opportunity to lead an independent summer project with measurable business and technical impact, and present your technical findings and recommendations to engineering teams and site leadership. Project areas include: EUV and DUV defect reduction, Contamination mitigation and control, Advanced wet cleaning chemistry development, Resist strip process optimization, Tool matching and qualification, Yield improvement initiatives, Process characterization and capability enhancement, Data analytics and process monitoring.

Requirements

• Currently pursuing an MS or PhD in Chemical Engineering, Chemistry, Materials Science, Physics, or a related technical field. Will not graduate prior to September 2027.
• Fundamental knowledge of chemistry, materials science, surface science, or semiconductor manufacturing processes.
• Strong analytical and problem-solving skills.
• Excellent written and verbal communication skills.
• Demonstrated ability to work independently and in a collaborative team environment.

Nice To Haves

• Experience with experimental design, statistical analysis, or Design of Experiments (DOE).
• Familiarity with semiconductor manufacturing, photolithography, or wafer/mask processing.
• Experience with data analysis tools such as Excel, JMP, Python, Tableau, or Power BI.
• Experience interpreting large datasets and generating actionable insights.
• Knowledge of contamination control, defect inspection, metrology, or surface characterization techniques.
• Familiarity with AI-assisted engineering tools, machine learning concepts, data analytics, or generative AI platforms such as Microsoft Copilot.

Responsibilities

• Support development and optimization of advanced photomask wet cleaning and resist strip processes.
• Design and implement experiments to evaluate process performance and find opportunities for improvement.
• Analyze defect, contamination, and yield data using statistical and analytical tools.
• Use data analytics to identify trends, establish process windows, and drive process improvements.
• Apply AI-assisted tools and advanced analytics to analyze process, defect, and equipment data.
• Characterize process equipment and evaluate tool-to-tool matching performance.
• Collaborate with process, manufacturing, equipment, and metrology engineers to investigate process excursions and implement corrective actions.
• Develop process characterizations, qualification plans, and technical documentation.
• Apply data science and machine learning techniques, where appropriate, to identify correlations, process trends, and yield improvement opportunities.

Benefits

• Choice of medical, dental and vision plans
• Benefit programs that help protect your income if you are unable to work due to illness or injury
• Paid family leave
• Robust paid time-off program
• Paid holidays

What This Job Offers

• Job Type: Full-time
• Career Level: Intern