As an intern on our team, you will contribute to exploratory (pathfinding) research in advanced photomask modeling, focusing on next-generation computational methods. You will work on investigating and evaluating novel electromagnetic (EM) solvers, advancing simulation techniques for photomask modeling in semiconductor lithography, and supporting early-stage research that influences future technology development. This role involves developing and testing computational models for photomask simulation, exploring new numerical approaches in computational electromagnetics (CEM), and writing and optimizing code (C++ and/or Python) for simulation tools. You will also analyze and interpret simulation data to guide design decisions and collaborate with cross-functional experts in optics, modeling, and software, presenting findings and recommendations to the team.
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Job Type
Full-time
Career Level
Intern