Senior Reticle Pattern Inspection Process Engineer

Micron•Boise, ID

About The Position

As a Senior Reticle Pattern Inspection Process Engineer at Micron Technology, you will develop and optimize advanced photomask inspection solutions supporting current and next-generation lithography technologies. The role focuses on reticle defect detection, automated defect classification, mask-to-wafer correlation, printability assessment, and inspection capability development. You will provide technical leadership across inspection programs and improve quality, yield, and manufacturing readiness through advanced analytics, AI-enabled workflows, and collaboration across functions. Micron describes itself as a world leader in memory and storage solutions and emphasizes employee wellbeing and professional growth. Its benefits include medical, dental, and vision plans, income-protection programs for illness or injury, paid family leave, paid time off, and paid holidays. Micron is an equal opportunity and affirmative action employer.

Requirements

Master's degree in Physics, Optics, Electrical Engineering, Materials Science, Mechanical Engineering, Chemical Engineering, or a related field; alternatively, a bachelor's degree with significant directly relevant industry experience.
At least 5 years of experience in photomask engineering, reticle inspection, wafer inspection, semiconductor defect engineering, advanced lithography, or related semiconductor manufacturing environments.
Experience developing, optimizing, qualifying, or sustaining advanced inspection processes and manufacturing systems.
Strong understanding of defect detection, defect classification, inspection sensitivity, nuisance reduction, and process optimization.
Experience leading technical projects and solving manufacturing challenges using statistical analysis and structured problem-solving methodologies.

Nice To Haves

Experience with EUV reticle inspection, High-NA EUV technologies, defect printability assessment, or mask-to-wafer correlation.
Experience with lithography simulation, aerial image analysis, wafer print checks, or physics-based defect assessment.
Experience developing automated defect classification, machine learning, advanced analytics, or AI-enabled inspection solutions.
Experience defining inspection-tool requirements and collaborating with equipment suppliers on emerging technologies.
Experience qualifying new equipment, software, algorithms, or manufacturing processes in advanced semiconductor environments.

Responsibilities

Develop, qualify, optimize, and sustain reticle pattern inspection processes, including EUV inspection and automated defect classification.
Lead defect characterization, printability assessment, and mask-to-wafer correlation activities to improve inspection effectiveness and defect disposition decisions.
Drive root-cause investigations and process improvements using SPC, FMEA, 8D, and data-driven problem-solving methodologies.
Lead equipment qualifications, supplier evaluations, technology assessments, and production-readiness activities for advanced inspection platforms.
Partner with lithography, mask engineering, manufacturing, R&D, and suppliers to introduce next-generation inspection capabilities and improve yield, productivity, and process stability.