Brookhaven National Laboratory (BNL) is entering an exciting new chapter with one of the newest and most advanced synchrotron facilities in the world. National Synchrotron Light Source II (NSLS-II) enables the study of material properties and functions with nanoscale resolution and exquisite sensitivity by providing world-leading capabilities for X-ray imaging and high-resolution energy analysis. This facility is open to users from academia and industry, and its operations are at a time when the world enters a new era with a global economy fueled largely by scientific discoveries and technological innovations. NSLS-II provides the research tools needed to foster new discoveries and create breakthroughs in critical areas such as energy security, environment, and human health. The Optics Group at the National Synchrotron Light Source II (NSLS-II) is seeking a Research Associate specializing in optical metrology for X-ray mirrors. The selected candidate will advance precision measurement and characterization of ultra-precision X-ray optics using the Optical Coordinate Measuring Machine (OCMM) platform. Working within the P3N (Pioneering Nanometrology and Nanofabrication for Next-Generation X-ray Mirrors) program, you will establish measurement workflows, validate metrology techniques, and contribute directly to enabling next-generation synchrotron capabilities. The OCMM is a key measurement platform for deterministic fabrication of high-curvature and freeform X-ray mirrors. You will develop and validate a documented, repeatable OCMM workflow capable of single-nanometer-level surface-height measurements. Your work will integrate baseline hardware characterization, reconstruction algorithm conditioning, software workflow development, and mirror validation against established BNL reference metrology methods. You will diagnose error sources, optimize measurement geometry, preserve data traceability, and produce analysis outputs suitable for fabrication feedback and comparison with reference techniques such as the Nano-accuracy Surface Profiler (NSP), Fizeau Stitching Interferometry (FSI), and Coherent Scanning Interferometry (CSI).
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Job Type
Full-time
Career Level
Entry Level
Education Level
Ph.D. or professional degree