Intern, Image Analysis - Summer 2027

Corning•City of Corning, NY

1d•$42,510 - $82,810

About The Position

Corning is seeking an Image Analysis Intern for Summer 2027. Deep UV (DUV) photolithography relies on glass and crystalline optics that remain highly transparent under 193 nm laser irradiation. Increasing laser power and microscopic material defects can contribute to surface or bulk damage, shortening the lifetime of optics used in semiconductor process tools. The intern will develop an image analysis algorithm to quantify surface damage on crystalline DUV optics after laser irradiation. After benchmarking the algorithm, the intern will apply it to historical laser damage images and correlate extracted damage features with measured laser damage threshold, lifetime, and laser fluence. The work is intended to improve understanding of laser-induced damage mechanisms. The intern will document the methodology and findings in a report or poster presentation and work with engineers and scientists to refine the approach. The program includes competitive salaries, housing assistance, travel reimbursement, social and networking events, volunteer opportunities, and community involvement. The position requires availability for 10 weeks during May–August 2027 and does not support immigration sponsorship. The pay range is $1,635.00–$3,185.00 biweekly; starting pay is determined by geographic location, position nature, and year in school.

Requirements

Currently pursuing a degree in Physics, Materials Science, Computer Science, or an Engineering discipline.
Exposure to coding languages and familiarity with basic computation and data analysis.
Available for 10 weeks during Summer 2027 (May–August 2027).
Expected graduation date of December 2027 or later.
Interested in working for Corning, Inc. after graduation if offered a full-time opportunity.
Willing to work at the posted job location.

Nice To Haves

Basic experience with Java, Matlab, C, C+, C#, Python, or another high-level programming language.
Data analysis experience using Excel, JMP, Origin, or similar tools.
Introductory knowledge of optics and materials science of semiconductor materials.
Laboratory or research experience.

Responsibilities

Develop an image analysis algorithm to quantify laser-induced damage on crystalline optic surfaces.
Validate the algorithm’s reliability and repeatability across image sets.
Apply the algorithm to historical laser damage images to generate quantitative data.
Correlate extracted damage features with laser damage lifetime and laser fluence.
Summarize methodology and results in a report or poster presentation.
Document methods and results so others can reproduce the analysis.
Interpret data trends and explain findings clearly to technical teammates.
Work with engineers and scientists to refine the approach based on feedback.