Staff Engineer, Metals Implant DRAM

Micron Technology • Boise, ID

2d • Hybrid

About The Position

Our vision is to transform how the world uses information to enrich life for all. Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. This Staff Engineer position involves performing process development for CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition) films, ion implantation and CMOS device optimization. The role requires applying materials characterization techniques such as X-ray photoelectron spectroscopy, x-ray diffraction, electron microscopy, secondary ion mass spectroscopy, resistance measurements and ellipsometry to characterize materials and make recommendations on vectors to improve materials performance towards program goals. It also includes the execution of novel materials development and characterization, statistical process control, and electrical characterization of CMOS devices, especially sense-amplifiers. The Staff Engineer will have ownership and experimental execution for high current, high energy and medium current implanters, as well as plasma doping systems. The position may allow part-time telecommuting, and domestic and international travel is required.

Requirements

• Ph.D. in Materials Science, Chemistry, Physics, Chemical Engineering or a related field.
• Chemical Vapor Deposition of films including metals and dielectrics
• Atomic Layer Deposition of films including metals and dielectrics
• X-ray photoelectron spectroscopy
• X-ray diffraction
• Electron Diffraction
• Resistance measurements
• Statistical Process Control
• Electrical Characterization of films and devices
• Design of Experiments
• Integration of multiple processes to form a device
• Capacitor devices including Metak-Insulator-Metal and Metal-OxideSemiconductor devices with high K-value dielectrics

Responsibilities

• Perform process development for CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition) films, ion implantation and CMOS device optimization.
• Apply materials characterization techniques such as X-ray photoelectron spectroscopy, x-ray diffraction, electron microscopy, secondary ion mass spectroscopy, resistance measurements and ellipsometry to characterize materials and make recommendations on vectors to improve materials performance towards program goals.
• Execute novel materials development and characterization, statistical process control, and electrical characterization of CMOS devices, especially sense-amplifiers.
• Take ownership and execute experiments for high current, high energy and medium current implanters, as well as plasma doping systems.

Benefits

• Choice of medical plans
• Choice of dental plans
• Choice of vision plans
• Benefit programs that help protect your income if you are unable to work due to illness or injury
• Paid family leave
• Robust paid time-off program
• Paid holidays

What This Job Offers

• Job Type: Full-time
• Career Level: Senior
• Education Level: Ph.D. or professional degree