Postdoctoral Appointee - Atomic Layer Deposition for X-ray Optics Fabrication

Argonne National Laboratory • Lemont, IL

13d

About The Position

The X-ray Science Division (XSD) at Argonne National Laboratory seeks a Postdoctoral Appointee to help develop advanced diffractive X-ray optics fabricated by atomic layer deposition (ALD). The appointee will develop and optimize ALD processes for depositing thick multilayer structures on flat and patterned substrates and characterize film thickness, crystallinity, strain, and optical properties using techniques including X-ray diffraction, X-ray reflectometry, transmission X-ray microscopy, and electron microscopy.

The role also involves contributing to the specification, design, and commissioning of ALD reactor systems; developing metrology methods to monitor and improve deposition accuracy during extended deposition campaigns; and participating in testing and evaluating diffractive optics at the 1-BM beamline and potentially other Advanced Photon Source beamlines. The position is in the XSD/Optics Group and involves collaboration with researchers across Argonne, including the Center for Nanoscale Materials, Materials Science Division, and Applied Materials Division.

Requirements

• Ph.D. in Chemistry, Materials Science and Engineering, Chemical Engineering, Physics, or a closely related field, completed within the last 0–5 years.
• Hands-on experience with ALD reactor operation, precursor chemistry, or process development.
• Experience with thin-film materials characterization techniques, such as ellipsometry, reflectometry, or microscopy.
• Experience with electron microscopy techniques (SEM and/or TEM) for structural analysis.
• Strong record of peer-reviewed publications commensurate with career stage.
• Good written and verbal communication skills.
• Ability to work independently and collaboratively in a multidisciplinary research environment.

Nice To Haves

• Familiarity with reaction kinetics and chemistry for ALD processes.
• Background in thin-film metrology instrumentation.
• Experience with nanofabrication processes, including lithography, deep reactive-ion etching, or related microfabrication techniques.

Responsibilities

• Develop and optimize ALD processes for depositing thick multilayer structures on flat and patterned substrates.
• Characterize film thickness, crystallinity, strain, and optical properties using analytical techniques including X-ray diffraction, X-ray reflectometry, transmission X-ray microscopy, and electron microscopy.
• Contribute to specification, design, and commissioning of ALD reactor systems.
• Develop metrology methods to monitor and improve deposition accuracy during extended deposition campaigns.
• Participate in testing and evaluation of diffractive optics at the 1-BM beamline and potentially other Advanced Photon Source beamlines.
• Collaborate with researchers across Argonne divisions, including CNM, MSD, and the Applied Materials Division.

Benefits

• Comprehensive benefits are part of the total rewards package.

What This Job Offers

• Job Type: Full-time
• Career Level: Senior
• Education Level: Ph.D. or professional degree