Postdoc: Ultraviolet Optical Coatings and Atomic Layer Deposition (ALD) - 2

NASA Jet Propulsion Laboratory

1d•Onsite

About The Position

JPL is seeking a postdoctoral scholar to lead research on the growth, characterization, and optimization of high-density, conformal metal fluoride coatings. This role involves investigating Atomic Layer Deposition (ALD) growth behaviors, improving process stability, and developing scalable approaches for potential industrial-scale implementation for flight hardware. The research aims to enhance current anti-reflection coatings into complex, multilayer UV optical systems by addressing challenges such as coating durability, interfacial chemistry, and long-term stability. The postdoctoral scholar will contribute to developing innovative thin-film deposition and surface analysis techniques, supporting high-impact publications, and advancing JPL’s leadership in astrophysics instrumentation. The appointee will collaborate with JPL scientists and engineers on ongoing, fully funded research efforts supporting NASA ROSES projects and future mission concepts. This is a research-focused position designed to expand JPL’s scientific capabilities.

Requirements

Ph.D. in Materials Science, Applied Physics, Chemistry, or a related field
Expertise in thin-film deposition techniques, particularly Atomic Layer Deposition (ALD)
Experience with vacuum-based systems and thin-film characterization methods
Strong background in experimental design and data analysis
Demonstrated record of peer-reviewed publications

Responsibilities

Conduct independent research in ALD-based thin-film growth for UV optical coatings
Develop and optimize multilayer coating architectures for stability and performance
Investigate in situ surface chemistry and interfacial processes impacting coating behavior
Support development of scalable and repeatable coating processes
Publish findings in peer-reviewed journals and present at scientific conferences
Collaborate with multidisciplinary teams across JPL