Intern - Process Pathfinding, DRAM Dry Etch

Micron Technology • Boise, ID

2d

About The Position

Our vision is to transform how the world uses information to enrich life for all. Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. Micron is a global leader in memory and storage innovation, developing technologies that power artificial intelligence, cloud computing, and advanced computing applications. The Process Pathfinding team explores next-generation semiconductor device architectures, materials, and manufacturing techniques that enable future memory technologies. This research-focused organization works at the forefront of technology development, transforming innovative concepts into scalable manufacturing solutions. As a Process Pathfinding Dry Etch Intern, you will work in a groundbreaking semiconductor technology development environment dedicated to future memory devices and process innovations. You will gain hands-on experience with advanced dry etch patterning techniques, semiconductor processing equipment, characterization methods, and approaches to developing processes. Working alongside experienced engineers and researchers, you will contribute to technical projects that improve device performance, reliability, and manufacturability while developing expertise in semiconductor technology development.

Requirements

• Currently pursuing a Master's degree or Ph.D. in Materials Science, Physics, Chemistry, Chemical Engineering, or a related technical field. Exceptional undergraduate candidates may be considered.
• Graduation date must be after August 1, 2027.
• Knowledge of vacuum science, RF/plasma science, chemistry, semiconductor processing, or semiconductor equipment gained through coursework, research, or industry experience.
• Experience with experimental design, data analysis, statistical methods, or laboratory-based research.
• Strong communication, analytical, problem-solving, and interpersonal skills with the ability to work independently and collaboratively.

Nice To Haves

• Experience with dry etch processing, plasma technologies, semiconductor fabrication, or advanced materials research.
• Experience Using AI, Data Science, programming, scripting, or automation tools to support technical analysis and engineering productivity.
• Familiarity with Python, MATLAB, JMP, R, or other analytical and data visualization platforms.
• Demonstrated ability to interpret complex data sets and translate findings into actionable technical recommendations.
• Experience presenting technical results to research, engineering, or academic audiences.

Responsibilities

• Assist in conducting fundamental research and process development activities that support next-generation memory technologies.
• Collaborate with the Pathfinding team to develop and optimize dry etch processes that meet physical and electrical performance requirements.
• Develop and complete experiments to understand process limitations, evaluate new technologies, and expand process capabilities.
• Apply analytical and statistical methods to characterize process performance, validate process capability, and solve complex plasma etch engineering challenges.
• Utilize AI-Enabled tools, Applying Artificial Intelligence, or Leveraging AI-assisted analytics to improve data analysis, engineering workflows, experiment evaluation, and technical decision-making.

Benefits

• Choice of medical, dental and vision plans
• Benefit programs that help protect your income if you are unable to work due to illness or injury
• Paid family leave
• Robust paid time off program
• Paid holidays

What This Job Offers

• Job Type: Full-time
• Career Level: Intern