Senior Associate Research Chemist

Fujifilm•Mesa, AZ

7d•Onsite

About The Position

The Senior Associate Research Scientist will support new Chemical Mechanical Polishing/Planarization (CMP) slurry and provide chemistry consultation to the technology development team. The primary focus will be the fundamental research and formulation development for BEOL slurries for next generation semiconductor technologies. FUJIFILM Electronic Materials, U.S.A. fuels innovation in the semiconductor industry—where chemistry meets technology. Our advanced materials and formulations enable manufacturers to build the microchips that power Artificial Intelligence, computers, electric vehicles, smartphones, and more. We’re a global business-to-business supplier of chemical formulations and advanced materials used for manufacturing and packaging semiconductors. Our chemical formulations allow top manufacturers to produce microchips that both power and connect our digital world. Think you’ve got what it takes to build a more connected world? Then connect with us today and challenge the boundaries of what’s possible—for the world and your future. We have six U.S. manufacturing and Research & Development facilities, located in: Mesa, Arizona; Castroville, California; Hollister, California; Carrollton, Texas; and North Kingstown, Rhode Island—each offering unique local experiences, from vibrant cultural scenes to historic charm. Fujifilm is globally headquartered in Tokyo with over 70,000 employees across four key business segments of healthcare, electronics, business innovation, and imaging. We are guided and united by our Group Purpose of “giving our world more smiles.”

Requirements

Ph.D. degree in Chemistry, Electrochemistry, Corrosion Engineering, Surface Chemistry, Material Science or Colloidal Science required.
Minimum of 5-10 years of industry R&D experience required.
Analytical abilities, experimental skills and expertise in chemistry and colloids and interface science required.
Excellent communication, data collection, time management and organizational skills required.
Proficiency in office software such as MS Excel, Word, PPT and Outlook required.
Resilience - Ability to adapt to workplace challenges, maintain professionalism, and manage responsibilities effectively.
Communication - Capacity to clearly and professionally exchange ideas, interact respectfully with colleagues and customers, and foster positive workplace relationships.
Reasoning & Decision Making - Ability to analyze information, follow verbal and written instructions, and make logical, sound decisions.
Comprehension - Capability to understand and complete tasks as assigned and solve problems effectively.
Organizational Skills - Competence in managing multiple priorities, maintaining accuracy, and staying focused despite potential workplace distractions.

Nice To Haves

Prior experience with the corrosion/protection science, nanomaterial, semiconductor industry (FEOL/MEOL/BEOL), CMP slurries, polishing and metrology tools, and abrasive particles used in CMP slurries preferred.
Previous proven success in formulation development is beneficial.
Familiarity with silica abrasives, Zeta Potential, corrosion, surfactants, and electrochemistry desired.
Highly motivated, creative individual with a passion for research and development leading to high-impact practical applications products for the semiconductor industry.

Responsibilities

Build up our comprehensive library of functional chemicals for CMP slurry and cleaner development including particles, corrosion inhibitors, removal rate enhancer, oxidants, and cleaner chemicals.
Develop the electrochemical methodologies to screen corrosion inhibitors and explore the fundamental mechanism of corrosion behavior on Integrated circuit (IC) chips through the integrated electrochemical and other techniques.
Enhance the competency of CMP-related fundamental studies, find root cause, compute theoretic models, and come out with solutions to address issue in a fast fashion.
Develop new CMP slurry formulations as per customer’s/semiconductor technology node need.
Apply knowledge of acids/bases, corrosion inhibitors, chemical/particle interactions, electrochemistry, organic/inorganic chemistry, surfactants, and interfacial chemistry to CMP slurry development.
Investigate chemistry and abrasive interactions with different dielectric and metal films.
Fine-tune slurry chemistry to get desired polishing rates & metrology performance.
Coordinate with engineering and the lab staff on formulation needs with respect to CMP slurry.
Provide consultation and technical expertise related to CMP slurries’ chemistries to Applications, R&D and Process Development/Manufacturing teams.
Conduct literature/ IP search, document results, present data to technology team & file patents.
Must be highly organized and have ability to handle multiple tasks and projects.
Must have ability to work extensively in lab environment and direct technicians to support project needs in an efficient manner.
Must be able to communicate and work well with other professionals in a team environment.
Job requires standing and working in the lab for a substantial part of every day.