Applications Scientist 3

Onto Innovation•Hillsboro, OR

2d•Onsite

About The Position

Onto Innovation is a leader in process control, combining global scale with an expanded portfolio of leading-edge technologies that include: 3D metrology spanning the chip from nanometer-scale transistors to micron-level die-interconnects; macro defect inspection of wafers and packages; metal interconnect composition; factory analytics; and lithography for advanced semiconductor packaging. Our breadth of offerings across the entire semiconductor value chain helps our customers solve their most difficult yield, device performance, quality, and reliability issues. Onto Innovation strives to optimize customers’ critical path of progress by making them smarter, faster and more efficient. Job Summary & Responsibilities The position reports to the Applications Manager and will be based in Hillsboro OR. Model Development & Validation: Design, build, and optimize scatterometry and ellipsometry models to support Intel’s 18A node virtual fab process flows. Perform sensitivity, parameter correlation, and residual analysis to ensure robust metrology performance. Lead model qualification and handoff to global support teams and end customers. Customer Engagement & Technical Interface: Serve as the primary modeling point-of-contact for Intel’s Virtual Fab engineers and stakeholders. Facilitate technical deep dives, working sessions, and reviews to align modeling objectives and process requirements. Translate customer feedback into actionable improvements and future modeling enhancements. Process & Documentation Excellence: Maintain detailed documentation of model architecture, simulation setup, and fitting workflows. Contribute to modeling knowledge base and internal process control libraries to improve reuse and scalability across programs. Technical Innovation & Enablement: Support evaluation and integration of next-generation modeling features (e.g., AI/ML fitting, hybrid modeling workflows). Mentor junior application scientists and field teams to scale modeling capability globally. Qualifications Successful candidates for this position will have: 2 years in industry metrology experience working with scatterometry/OCD (preferred) and optical thin films Process and equipment-related experience in instrumentation and calibration procedures Strong understanding of semiconductor manufacturing processes and Logic device process flows Strong data analysis skills and a high level of attention to detail The ability to work as an individual contributor on projects or in collaboration with a team Excellent communication, organizational, and interpersonal skills Ability to travel domestically up to 25% Required Education: MS/Ph.D. in Applied Physics, Materials Science, Electrical Engineering, Applied Mathematics or related science and engineering field Why Join Onto Innovation? At Onto Innovation, we believe your work should matter—and so should your well-being. That’s why we offer competitive salaries and a comprehensive benefits package designed to support you and your family. From health, dental, and vision coverage to life and disability insurance, PTO, and a 401(k) with employer match, we’ve got you covered. You’ll also enjoy access to our Employee Stock Purchase Program (ESPP), wellness initiatives, and cutting-edge tools—all within a collaborative, inclusive culture where your contributions are valued and recognized. Compensation & Growth Base Salary Range: $96,800.00 - $145,200.00, offered in good faith and based on experience, location, and qualifications. Additional Rewards: Annual bonus opportunities and potential long-term incentives tied to both company and individual success. Empowering Every Voice to Shape the Future: Onto Innovation is committed to creating a workplace where every qualified candidate has an equal opportunity to succeed. We evaluate applicants based on skills, experience, and potential - without regard to race, color, religion, gender, sexual orientation, national origin, age, disability, veteran status, or any other characteristic protected by law. We believe diversity of thought and background drives innovation and strengthens our team. Important Note on Export Compliance For certain positions requiring access to technical data, U.S. export licensing review may be necessary for applicants who are not U.S. Citizens, Permanent Residents, or other protected persons under 8 U.S.C. 1324b(a)(3).

Requirements

2 years in industry metrology experience working with scatterometry/OCD (preferred) and optical thin films
Process and equipment-related experience in instrumentation and calibration procedures
Strong understanding of semiconductor manufacturing processes and Logic device process flows
Strong data analysis skills and a high level of attention to detail
The ability to work as an individual contributor on projects or in collaboration with a team
Excellent communication, organizational, and interpersonal skills
Ability to travel domestically up to 25%
MS/Ph.D. in Applied Physics, Materials Science, Electrical Engineering, Applied Mathematics or related science and engineering field

Responsibilities

Design, build, and optimize scatterometry and ellipsometry models to support Intel’s 18A node virtual fab process flows.
Perform sensitivity, parameter correlation, and residual analysis to ensure robust metrology performance.
Lead model qualification and handoff to global support teams and end customers.
Serve as the primary modeling point-of-contact for Intel’s Virtual Fab engineers and stakeholders.
Facilitate technical deep dives, working sessions, and reviews to align modeling objectives and process requirements.
Translate customer feedback into actionable improvements and future modeling enhancements.
Maintain detailed documentation of model architecture, simulation setup, and fitting workflows.
Contribute to modeling knowledge base and internal process control libraries to improve reuse and scalability across programs.
Support evaluation and integration of next-generation modeling features (e.g., AI/ML fitting, hybrid modeling workflows).
Mentor junior application scientists and field teams to scale modeling capability globally.