Postdoctoral Appointee – Selective Area Atomic Layer Deposition for Microelectronics

Argonne National Laboratory•Lemont, IL

1d•Onsite

About The Position

The Applied Materials Division in the Functional Coatings Group at Argonne National Laboratory has an immediate opening for a Postdoctoral Appointee The successful applicant will play a pivotal role in advancing our research project in selective area atomic layer deposition (SA-ALD) for applications in microelectronics. In particular, the new hire will develop novel surface chemistries for the SA-ALD of metals and dielectrics using small molecule inhibitors with high selectivity towards a range of surfaces. The postdoctoral appointee will develop structure-function-property relationships that will enable a comprehensive understanding of the fundamental mechanisms that underly SA-ALD. The postdoctoral appointee is expected to aid in the design, analysis, and interpretation of experiments as well as present findings to the community through publications and presentations.

Requirements

Recent or soon-to-be-completed PhD (typically completed within the last 0-5 years) in physics, chemistry, or materials science with 0 to 2 years of experience, or the equivalent experience through practical application in a laboratory.
Knowledge of and experience with atomic layer deposition methods and equipment.
Knowledge of and experience with in-situ measurement techniques for atomic layer deposition including infrared spectroscopy and quartz crystal microbalance.
Skills working interactively and productively in a multidisciplinary environment.
Skills in oral and written communication.
Record of publication and external recognition in these areas.
Ability to work independently on a day-to-day basis.
Demonstrated interpersonal, oral, and written communication.
Ability to model Argonne’s Core Values: Impact, Safety, Respect, Integrity, and Teamwork.