The Photo Engineer – Lithography & Mask Layout position is a technical ownership role within an Indium Phosphide ( InP ) wafer fabrication facility supporting the manufacturing of DFB lasers, Semiconductor Optical Amplifiers (SOAs), and Gain Chip (GC) products. This role is responsible for end-to-end photolithography process development and manufacturing support, including full ownership of mask and reticle layout strategy, stepper and coat/develop track processes, and critical dimension (CD) and overlay control . The position serves as the primary lithography technical authority for InP device manufacturing, ensuring robust, repeatable, and high-yield lithography processes from tape- out through production. The role requires hands-on expertise in photolithography equipment, layout data preparation, process control, and yield improvement in a compound semiconductor wafer fab environment.
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Job Type
Full-time
Career Level
Mid Level
Number of Employees
501-1,000 employees