ASML US, LP brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, and more energy-efficient microchips. We design, develop, integrate, market, and service these advanced machines, which enable our customers—the world’s leading chipmakers—to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Wilton, CT, Chandler, AZ, San Jose, CA and San Diego, CA. We are presenting you with a unique and exciting opportunity to join a dynamic and innovative source research team, focused on conceiving and demonstrating the technologies required for next generations of high-power extreme ultraviolet (EUV) light sources. Based on a laser produced plasma (LPP), our light source relies on a wide range of unique and challenging technologies, ranging from laser light amplification and high-power optical systems that generate the laser pulses needed for EUV generation to electro-optical signal detection and algorithm-based actuation for process control. You are invited to bring your passion, knowledge and expertise in areas of applied physics, plasmas, metrology, optics, controls, lasers, and experimental design to push the boundaries of these technologies forward. A key ingredient in the EUV generation process is a stable source of molten tin droplets. These droplets provide the fuel for the laser-produced plasma and serve as the heartbeat for synchronizing the EUV source. The challenge is to reliably produce nearly perfect droplets of molten tin at a rate of tens of thousands of times per second with speeds of dozens of meters per second and position stability within a fraction of a droplet diameter. If these dimensions were scaled up to the game of golf, this would be equivalent to continuously scoring hole-in-ones in a hole that’s 25 km away through swirling gas flows and a plasma that’s hotter than the surface of the sun. The successful candidate will be comfortable operating in this diverse mix of physics, engineering, and materials science in order to define the droplet generator architecture for the next generation EUV source. The successful candidate will also have a passion for innovation, be driven by curiosity, and have deep technical understanding, all essential to excel in a Research environment operating at the fuzzy front end of product development. A strong experimental mindset is needed to measure complex phenomena and decipher the relevant physics, enabling our team to predictably control tin droplet behavior.
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Career Level
Intern
Number of Employees
5,001-10,000 employees