ASML US D&E branch focuses on developing modern computational lithography technology, that enable our most advanced lithography machines working at their best performance and efficiency. The main tasks include develop computational lithographic simulation flow (mask, optics, resist and etch), improve accuracy and speed with wide range of conventional and machine learning optimization algorithms. Your Assignment Take on research, modeling and simulation of the physical process of lithography. Develop and optimize C/C++ codes and algorithm for computational lithography modeling. Write unit tests for algorithms and modules. Develop machine-learning based models and solutions for image processing, image recognition. Evaluate pro and cons among solutions and suggest the best solutions to fulfill the requirements. Keep good documentation of design and implementations.
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Career Level
Intern
Number of Employees
5,001-10,000 employees