Our vision is to transform how the world uses information to enrich life for all. Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. As a Lithography pathfinding process development engineer at Micron Technology in Boise, Idaho, you will evaluate advanced lithography including Extreme Ultra Violet (EUV) and High Numerical Aperture (High NA) EUV on next-generation memory parts. You will collaborate with our team to define roadmap requirements for next-generation memory, and how new technologies intercept our roadmap. You will partner with technology development and manufacturing to ensure they will be ready to implement EUV and other new patterning approaches. This role may require travel to support high NA EUV work. Responsibilities: In this role, you will need to have strong semiconductor pathfinding skills in an R&D department specific to High NA EUV and photolithography. This position is intended to be part of Micron's Technical Leadership Program (TLP). This is a career path for individuals seeking to advance as technical leaders and industry innovators. TLP members are expected to influence, lead, and mentor others.
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Job Type
Full-time
Career Level
Mid Level