ASML US, LP brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Wilton, CT, Chandler, AZ, San Jose, CA and San Diego, CA. Job Mission We have an exciting opportunity for an experienced Controls Scientist to join our dynamic and innovative Controls team in San Diego, Ca. This team is focused on conceiving and demonstrating the technologies required for next generations of high-power extreme ultraviolet (EUV) light sources within ASML. Based on a laser produced plasma (LPP), our light source relies on a wide range of unique and challenging technologies, ranging from laser light amplification and high-power optical systems to laser produced plasma for EUV generation, electro-optical signal detection and algorithm-based actuation for process control. You are invited to bring your passion, knowledge and expertise in areas of applied physics, plasmas, metrology, optics, controls, lasers, and experiment design to push the boundaries of these technologies forward. The Controls team is responsible for the development and engineering of the control system for the experimental EUV light source system within research. The complexity of the EUV source puts exciting and challenging demands on the Control Scientist who will be engaged in all phases of the control system development and integration, such as developing advanced control solutions that improve the performance, stability, real-time embedded software, and capability of next generation EUV light sources. This role blends experimental research, modeling, algorithm development, and cross functional collaboration to drive technology innovation from concept to validated prototype within ASML’s Source Research organization. The successful candidate will be comfortable operating in this diverse mix of physics, engineering and computer science, in order to define the control architecture for next generations of the EUV source. The successful candidate will also have a passion for innovation, be driven by curiosity, and have deep technical understanding, in order to excel in a Research environment operating at the fuzzy front end of product development. A key ingredient for success in this space is the ability to operate across multi-competence boundaries and translate learnings between them. A strong analytical mindset is needed to abstract requirements into models which capture the relevant physics, resulting in predictable behavior of the control system.
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Job Type
Full-time
Career Level
Mid Level
Education Level
Ph.D. or professional degree