Join KLA’s computational patterning group as a Summer Intern and contribute to cutting‑edge research in computational methods for optical imaging. In this role, you will help evaluate and advance simulation technologies used to model patterned‑wafer defects, directly impacting next‑generation inspection solutions. You will: Perform electromagnetic simulations to assess optical inspection sensitivity for nano‑scale patterned‑wafer defects Evaluate and benchmark computational methods and algorithms, with a focus on performance, accuracy, and scalability Explore new concepts to reduce simulation turnaround time while maintaining high physical fidelity Analyze and compare CPU‑ and GPU‑accelerated solutions for large‑scale physics‑based simulations Collaborate with researchers and engineers to translate simulation insights into practical inspection improvements
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Career Level
Intern
Number of Employees
5,001-10,000 employees